NEW YORK, New York - The International Society of Industrial Ecology (ISIE), based at Yale University, announced plans to establish the Robert Laudise Medal for Industrial Ecology. The award will be given annually to an accomplished young industrial ecologist. The award is supported by a contribution from AT&T.

The medal is designed to bring increased attention to the contributions that industrial ecology can make toward improving the environmental performance of industrial activities. While there are research fellowships available for scholars interested in furthering the concepts of industrial ecology, there are no awards specifically targeted to recognize the work of those in the field. The Robert Laudise Medal fills that gap.

"Robert Laudise played a critical role in establishing the new field of industrial ecology," said Dr. Thomas Graedel, Clifton R. Musser Professor of Industrial Ecology at the Yale School of Forestry & Environmental Studies. "We are proud and pleased that we will be able to offer an award in his name to outstanding young industrial ecologists."

The award is named for the late Robert A. Laudise, who is recognized for having advanced the concepts of industrial ecology as a critically important field while employed at AT&T Bell Laboratories (Bell Labs).

Laudise earned his doctorate in organic chemistry from the Massachusetts Institute of Technology before joining Bell Labs in 1956, where he had a distinguished research and managerial career until his death in 1998. Through his leadership and guidance, the groups he led transferred optical-fiber technology to production. His research interests included solid-state chemistry, materials science and materials conservation, and crystal growth.

The International Society of Industrial Ecology promotes industrial ecology as a way of finding innovative solutions to complicated environmental problems. The society, which is based at the Yale School of Forestry & Environmental Studies www.yale.edu/environment, also facilitates communication among scientists, engineers, policymakers, managers and advocates who are interested in how environmental concerns and economic activities can be better integrated. Not only has AT&T supported the establishment of the society, but also awards six AT&T Industrial Ecology Faculty Fellowships annually to researchers at colleges and universities. For more information about the ISIE, call 203-436-4835 or visit www.yale.edu/is4ie.

"AT&T is delighted to have the opportunity to honor our late colleague, Dr. Laudise," said Brad Allenby, AT&T environment, health and safety vice president. "We are also enthusiastic about the ISIE's commitment to promote the use of industrial ecology in research, education, policy, community development and industrial practices."

The AT&T Foundation invests in projects that address a range of public concerns. Emphasis is placed on programs that serve the needs of people in communities where AT&T has a significant business presence; initiatives that use technology in innovative ways; and programs that AT&T employees are actively involved with as contributors and/or volunteers. AT&T has donated more than $7 million toward environmental programs since 1996. For further information, please visit the AT&T Foundation Web site at www.att.com/foundation.

AT&T Inc.

AT&T Inc.

More from AT&T Inc.